16a-S-12 High-k絶縁膜中の欠陥生成と信頼性劣化 － HfSiO4中の格子間水素 －

16a-S-12 High-k絶縁膜中の欠陥生成と信頼性劣化－ HfSiO4中の格子間水素－

中崎靖, 平野泉, 加藤弘一, Yuichiro MITANI

Research output: Contribution to conference › Presentation

Conference	第71回応用物理学会学術講演会
Period	14/09/10 → …

@conference{53359b452c4143c0b152ad63c8640593,

title = "16a-S-12 High-k絶縁膜中の欠陥生成と信頼性劣化－ HfSiO4中の格子間水素－",

author = "\{中崎靖\} and \{平野泉\} and 加藤弘一 and Yuichiro MITANI",

year = "2010",

month = sep,

day = "16",

language = "Japanese",

note = "第71回応用物理学会学術講演会 ; Conference date: 14-09-2010",

}