Development of Technique to Form a Uniform Photoresist Layer Having Over 100 Micrometers Thickness on a Substrate

Tamio Fujiwara, Haruyuki Kinoshita, Koichi Nishibe, Teruo Fujii, Hiroshi Ohue, Koichi NISHIBE

Research output: Contribution to journal › Misc › peer-review

Translated title of the contribution	Development of Technique to Form a Uniform Photoresist Layer Having Over 100 Micrometers Thickness on a Substrate
Original language	American English
Pages (from-to)	55 -
Journal	Proceedings of the 6th International Symposium on Microchemistry and Microsystems
State	Published - 2014

Cite this

@article{abdf6c2ecb964fb59963735a79350c56,

title = "Development of Technique to Form a Uniform Photoresist Layer Having Over 100 Micrometers Thickness on a Substrate",

author = "\{Tamio Fujiwara\} and \{Haruyuki Kinoshita\} and \{Koichi Nishibe\} and \{Teruo Fujii\} and \{Hiroshi Ohue\} and Koichi NISHIBE",

year = "2014",

language = "American English",

pages = "55 --",

journal = "Proceedings of the 6th International Symposium on Microchemistry and Microsystems",

}

TY - JOUR

T1 - Development of Technique to Form a Uniform Photoresist Layer Having Over 100 Micrometers Thickness on a Substrate

AU - Tamio Fujiwara, null

AU - Haruyuki Kinoshita, null

AU - Koichi Nishibe, null

AU - Teruo Fujii, null

AU - Hiroshi Ohue, null

AU - NISHIBE, Koichi

PY - 2014

Y1 - 2014

M3 - Misc

SP - 55 -

JO - Proceedings of the 6th International Symposium on Microchemistry and Microsystems

JF - Proceedings of the 6th International Symposium on Microchemistry and Microsystems

ER -