| Original language | Japanese |
|---|---|
| Pages (from-to) | 603 - 605 |
| Journal | Default journal |
| State | Published - 1993 |
Initial Stage of Oxidation of Hydrogen-Terminated Silicon Surface
K. Ohishi, H. Nohira, Y. Shimizu, Y. Tamura, T. Hattori, Hiroshi NOHIRA
Research output: Contribution to journal › Misc