Internal Modification of Ultra Thin Silicon Wafer by Permeable Pulse Laser

Translated title of the contribution: Internal Modification of Ultra Thin Silicon Wafer by Permeable Pulse Laser

E. Ohmura, M. Kumagai, K. Fukumitsu, K. Kuno, M. Nakano, H. Morita, Masayoshi KUMAGAI

Research output: Contribution to journal › Misc

Translated title of the contribution	Internal Modification of Ultra Thin Silicon Wafer by Permeable Pulse Laser
Original language	Japanese
Pages (from-to)	- -
Journal	Default journal
Volume	CDROM
State	Published - 2007

Cite this

@article{c271a6aaacd445c1b207733a9328a429,

title = "Internal Modification of Ultra Thin Silicon Wafer by Permeable Pulse Laser",

author = "\{E. Ohmura\} and \{M. Kumagai\} and \{K. Fukumitsu\} and \{K. Kuno\} and \{M. Nakano\} and \{H. Morita\} and Masayoshi KUMAGAI",

year = "2007",

language = "Japanese",

volume = "CDROM",

pages = "-- --",

journal = "Default journal",

publisher = "The University of Tokyo Press",

}