LSI製造における電気めっき制御槽のしゃへい板配置の最適化

Translated title of the contribution: Optimization of Sheild Location in Electroplating Control Cell for LSI Fabrication

安部勇仁, Yoshinao KISHIMOTO, 森田岳, 小林志好, 大塚年久

Research output: Contribution to conferencePresentation

Translated title of the contributionOptimization of Sheild Location in Electroplating Control Cell for LSI Fabrication
Original languageJapanese
StatePublished - Sep 2011
EventMechanical Engineering Congress, 2011 Japan -
Duration: 1 Sep 2011 → …

Conference

ConferenceMechanical Engineering Congress, 2011 Japan
Period1/09/11 → …

Cite this