Production and Growth Mechanism of Individually- and Vertically -Aligned Single-Walled Carbon Nanotubes under the Plasma-Enhanced Chemical Vapor Deposition Method

T. Kato; G.-H. Jeong; T. Hirata; R. Hatakeyama; K. Tohji; Takamichi HIRATA

doi:10.1016/j.cplett.2003.10.007

Production and Growth Mechanism of Individually- and Vertically -Aligned Single-Walled Carbon Nanotubes under the Plasma-Enhanced Chemical Vapor Deposition Method

T. Kato, G.-H. Jeong, T. Hirata, R. Hatakeyama, K. Tohji, Takamichi HIRATA

Department of Medical Engineering

Research output: Contribution to journal › Article › peer-review

Translated title of the contribution	Production and Growth Mechanism of Individually- and Vertically -Aligned Single-Walled Carbon Nanotubes under the Plasma-Enhanced Chemical Vapor Deposition Method
Original language	American English
Pages (from-to)	-
Journal	Abstract of Int. Conf. on the Science and Application of Nanotubes
DOIs	https://doi.org/10.1016/j.cplett.2003.10.007
State	Published - Jul 2004

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10.1016/j.cplett.2003.10.007

Cite this

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AU - T. Kato, null

AU - G.-H. Jeong, null

AU - T. Hirata, null

AU - R. Hatakeyama, null

AU - K. Tohji, null

AU - HIRATA, Takamichi

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JO - Abstract of Int. Conf. on the Science and Application of Nanotubes

JF - Abstract of Int. Conf. on the Science and Application of Nanotubes

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