Strain field fluctuation in SiGe buffer layers and its reduction by ion implantation technique

K. Sawano, N. Usami, K. Nakagawa, Y. Shiraki, Kentarou SAWANO

Research output: Contribution to conference › Presentation

Translated title of the contribution	Strain field fluctuation in SiGe buffer layers and its reduction by ion implantation technique
Original language	American English
State	Published - Nov 2005
Event	Seventh International Conference on New Phenomena in Mesoscopic Structures - Duration: 1 Nov 2005 → …

Conference	Seventh International Conference on New Phenomena in Mesoscopic Structures
Period	1/11/05 → …

Cite this

@conference{d9f682dc66974aa78b3d225f623ed5d5,

title = "Strain field fluctuation in SiGe buffer layers and its reduction by ion implantation technique",

author = "\{K. Sawano\} and \{N. Usami\} and \{K. Nakagawa\} and \{Y. Shiraki\} and Kentarou SAWANO",

year = "2005",

month = nov,

language = "American English",

note = "Seventh International Conference on New Phenomena in Mesoscopic Structures ; Conference date: 01-11-2005",

}