X-Ray Photoelectron Spectroscopy Study on Dielectric Properties of AlN and Al2O3 Films

K. Hirose; H. Suzuki; T. Matsuda; Y. Takenaga; H. Nohira; E. Ikenaga; D. Kobayashi; T. Hattori; Hiroshi NOHIRA

X-Ray Photoelectron Spectroscopy Study on Dielectric Properties of AlN and Al2O3 Films

K. Hirose, H. Suzuki, T. Matsuda, Y. Takenaga, H. Nohira, E. Ikenaga, D. Kobayashi, T. Hattori, Hiroshi NOHIRA

Department of Electrical,Electronic and Communication Engineering

Research output: Contribution to journal › Misc

Original language	Japanese
Pages (from-to)	25 - 26
Journal	Default journal
State	Published - 2006

Cite this

@article{73ce7a8dd62d4d80a65a963c4e9d250b,

title = "X-Ray Photoelectron Spectroscopy Study on Dielectric Properties of AlN and Al2O3 Films",

author = "\{K. Hirose\} and \{H. Suzuki\} and \{T. Matsuda\} and \{Y. Takenaga\} and \{H. Nohira\} and \{E. Ikenaga\} and \{D. Kobayashi\} and \{T. Hattori\} and Hiroshi NOHIRA",

year = "2006",

language = "Japanese",

pages = "25 -- 26",

journal = "Default journal",

publisher = "The University of Tokyo Press",

}

TY - JOUR

T1 - X-Ray Photoelectron Spectroscopy Study on Dielectric Properties of AlN and Al2O3 Films

AU - K. Hirose, null

AU - H. Suzuki, null

AU - T. Matsuda, null

AU - Y. Takenaga, null

AU - H. Nohira, null

AU - E. Ikenaga, null

AU - D. Kobayashi, null

AU - T. Hattori, null

AU - NOHIRA, Hiroshi

PY - 2006

Y1 - 2006

M3 - Misc

SP - 25

EP - 26

JO - Default journal

JF - Default journal

ER -